Our FILWEL polishing pads are designed using technical knowledge obtained from over 40 years of synthetic leather manufacturing. Leading edge techniques in non-woven fabric manufacturing and resin impregnation allow us to offer solutions for our most challenging customer processes.

In addition, our advanced manufacturing yields provide our products with a cost advantage over other available products in the market place. We follow rigorous quality control throughout our system to the stringent requirements of today’s processes. Our team is eager to work with you to develop the products best suited for your applications.

pads

Advantages

  • Competitive pricing
  • Pads designed for optimal finishes
  • Strict quality control standards
  • Various pad types and options
  • Consistent lot-to-lot performance

Common Material Applications

  • Glass
  • Germanium
  • Gallium Arsenide
  • Ceramics
  • Aluminum
  • Silicon
  • Quartz
  • Lithium Niobate
  • Sapphire

Pad Customization Options

Using a variety of CNC tools, we have the ability to provide a pad customized to your tool configurations.

Sizes and Shapes

  • Many pad sizes available upon request
  • Common square and circle and ID cuts are available upon request

Pressure Sensitive Adhesive (PSA)

  • All pads can be supplied with a specially developed PSA

Grooving Patterns

  • Various grooving patterns available to meet your specifications
Pads Table
Pads Image
Pads Image

Stock Removal Pads

We offer a line of stock removal pads that is made of a polyurethane-resin-impregnated non-woven substrate developed from a unique polyester fiber technology. This combination of material provides a solid medium for many different high precision polishing applications, from intermediate to stock removal. Our stock removal pads come in a variety of different physical properties. Please contact us for more information.

Pads Image
Pads Image

Final Polish Pads

Our final polishing pads are composed of a vertical oriented porous layer that is formed on a polyurethane-impregnated non-woven substrate. With the use of our final polish pads, a high level of surface finish and pad longevity can be achieved. Our final polishing pads come in a variety of different physical properties. Please contact us for more information.

Pads Image
Pads Image

Edge Polish Pads

Our edge polishing pads have been developed with a special resin formulation to endure the impacts and load forces created by the edge polishing process. Our pad is composed of a very soft and durable non-woven material that provides good removal rates in-conjuction with low defectivity and scratch performance. Please contact us for more information.

Pads Image
Pads Image

Backing Insert Pads

Our poromeric backing pads are manufactured to have a vertical oriented porous layer on a PET substrate. This produces a highly flat and consistent material for backing pad applications. Backing pads can be precision die cut for a variety of different wafer shapes and sizes. Please contact us for more information.

Please contact us for additional information.